| dc.contributor.advisor | Rafael Reif. | en_US |
| dc.contributor.author | Kim, Hyoun-woo | en_US |
| dc.date.accessioned | 2005-09-26T18:37:04Z | |
| dc.date.available | 2005-09-26T18:37:04Z | |
| dc.date.copyright | 1994 | en_US |
| dc.date.issued | 1994 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/28125 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994. | en_US |
| dc.description | Includes bibliographical references (leaves 138-143). | en_US |
| dc.description.statementofresponsibility | by Hyoun-woo Kim. | en_US |
| dc.format.extent | 143 leaves | en_US |
| dc.format.extent | 8771647 bytes | |
| dc.format.extent | 8790822 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | en_US | |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Materials Science and Engineering | en_US |
| dc.title | Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 32147490 | en_US |
