Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure
Author(s)
Kim, Hyoun-woo![Thumbnail](/bitstream/handle/1721.1/28125/32147490-MIT.pdf.jpg?sequence=5&isAllowed=y)
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Advisor
Rafael Reif.
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Show full item recordDescription
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994. Includes bibliographical references (leaves 138-143).
Date issued
1994Department
Massachusetts Institute of Technology. Department of Materials Science and EngineeringPublisher
Massachusetts Institute of Technology
Keywords
Materials Science and Engineering