Deposition and characterization of very low pressure CVD silicon/silicon-germanium heteroepitaxial structures

Author(s)
Tsai, Curtis.
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Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1992
 
Includes bibliographical references (leaves 135-146).
 
Date issued
1992
URI
https://hdl.handle.net/1721.1/164703
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science
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