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Healing of donor defect states in monolayer molybdenum disulfide using oxygen-incorporated chemical vapour deposition

dc.contributor.authorShen, Pin-Chun
dc.contributor.authorLin, Yuxuan
dc.contributor.authorSu, Cong
dc.contributor.authorMcGahan, Christina
dc.contributor.authorLu, Ang-Yu
dc.contributor.authorJi, Xiang
dc.contributor.authorWang, Xingzhi
dc.contributor.authorWang, Haozhe
dc.contributor.authorMao, Nannan
dc.contributor.authorGuo, Yunfan
dc.contributor.authorPark, Ji-Hoon
dc.contributor.authorWang, Yan
dc.contributor.authorTisdale, William
dc.contributor.authorLi, Ju
dc.contributor.authorLing, Xi
dc.contributor.authorAidala, Katherine E.
dc.contributor.authorPalacios, Tomás
dc.contributor.authorKong, Jing
dc.date.accessioned2022-07-13T20:09:44Z
dc.date.available2022-07-13T17:54:32Z
dc.date.available2022-07-13T20:09:44Z
dc.date.issued2021-12
dc.date.submitted2020-07
dc.identifier.issn2520-1131
dc.identifier.urihttps://hdl.handle.net/1721.1/143723.2
dc.language.isoen
dc.publisherSpringer Science and Business Media LLCen_US
dc.relation.isversionofhttp://dx.doi.org/10.1038/s41928-021-00685-8en_US
dc.rightsArticle is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.en_US
dc.sourceMIT web domainen_US
dc.titleHealing of donor defect states in monolayer molybdenum disulfide using oxygen-incorporated chemical vapour depositionen_US
dc.typeArticleen_US
dc.identifier.citationShen, Pin-Chun, Lin, Yuxuan, Su, Cong, McGahan, Christina, Lu, Ang-Yu et al. 2022. "Healing of donor defect states in monolayer molybdenum disulfide using oxygen-incorporated chemical vapour deposition." Nature Electronics, 5 (1).en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.contributor.departmentMassachusetts Institute of Technology. Department of Nuclear Science and Engineering
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.relation.journalNature Electronicsen_US
dc.eprint.versionAuthor's final manuscripten_US
dc.type.urihttp://purl.org/eprint/type/JournalArticleen_US
eprint.statushttp://purl.org/eprint/status/PeerRevieweden_US
dc.date.updated2022-07-13T17:44:18Z
dspace.orderedauthorsShen, P-C; Lin, Y; Su, C; McGahan, C; Lu, A-Y; Ji, X; Wang, X; Wang, H; Mao, N; Guo, Y; Park, J-H; Wang, Y; Tisdale, W; Li, J; Ling, X; Aidala, KE; Palacios, T; Kong, Jen_US
dspace.date.submission2022-07-13T17:44:23Z
mit.journal.volume5en_US
mit.journal.issue1en_US
mit.licensePUBLISHER_POLICY
mit.metadata.statusAuthority Work Neededen_US


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