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dc.contributor.advisorMartin L. Culpepper.en_US
dc.contributor.authorRoan, Earl Tayloren_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Mechanical Engineering.en_US
dc.date.accessioned2008-02-27T20:37:20Z
dc.date.available2008-02-27T20:37:20Z
dc.date.copyright2007en_US
dc.date.issued2007en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/40310
dc.descriptionThesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2007.en_US
dc.descriptionThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.en_US
dc.descriptionIncludes bibliographical references (p. 53-54).en_US
dc.description.abstractIncreasing demand for nano-scale machining processes in the semiconductor industry necessitates new mechanisms for nano-machining. A system capable of nano-scale machining of conductive material via Electronic Pen Lithography (EPL) may fit this niche. The purpose of this research is to develop a system capable of EPL based on a HexFlex six axis nano-manipulator. The system will also be capable of Scanning Tunneling Microscopy (STM), which is will locate the surface with the precision necessary for EPL and also allow the user to confirm the machined features immediately after machining. The import of this work is the development of a low-cost and compact system for nano-machining and nano-scale imaging. The impact of this work may improve the process for manufacturing semiconductors including circuitry, MEMS, and NEMS. The continued development of full six axis machining techniques may allow for the construction of features hitherto impossible to fabricate. This segment of the project focuses on the integration of the HexFlex, a micron stepper motor, precision mounts, a preload diaphragm, and an advanced control system capable of automated EPL and STM verification. Steady electron tunneling is first demonstrated, followed by STM imaging functionality. However, high-speed, high-accuracy EPL machining techniques are reserved for future work.en_US
dc.description.statementofresponsibilityby Earl Taylor Roan.en_US
dc.format.extent54 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMechanical Engineering.en_US
dc.titleDesign of an STM and EPL control system and linear actuator preload diaphragmen_US
dc.title.alternativeDesign of an Scanning Tunneling Microscopy and Electronic Pen Lithography control system and linear actuator preload diaphragmen_US
dc.typeThesisen_US
dc.description.degreeS.B.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc191749987en_US


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