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Applied Plasma Research

dc.contributor.authorHirshman, Steven P.en_US
dc.contributor.authorSmullin, Louis D.en_US
dc.contributor.authorRoss, Arthur H. M.en_US
dc.date.accessioned2010-07-14T21:55:49Z
dc.date.available2010-07-14T21:55:49Z
dc.date.issued1973-04-15en_US
dc.identifierRLE_QPR_109_VIen_US
dc.identifier.urihttp://hdl.handle.net/1721.1/56390
dc.descriptionContains reports on two research projects.en_US
dc.description.sponsorshipNational Science Foundation (Grant GK-28282X1)en_US
dc.description.sponsorshipNational Science Foundation (Grant GK-33843)en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Quarterly Progress Report, April 15, 1973en_US
dc.relation.ispartofPlasma Dynamicsen_US
dc.relation.ispartofApplied Plasma Researchen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Quarterly Progress Report, no. 109en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherApplied Plasma Researchen_US
dc.subject.otherActive Plasma Systemsen_US
dc.subject.otherLaser-Plasma Interactionsen_US
dc.titleApplied Plasma Researchen_US
dc.typeTechnical Reporten_US


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