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dc.contributor.authorEberle, F. W.en_US
dc.contributor.authorGadzuk, J. W.en_US
dc.contributor.authorFehrs, D. L.en_US
dc.contributor.authorGreaves, W.en_US
dc.date.accessioned2010-06-07T19:03:36Z
dc.date.available2010-06-07T19:03:36Z
dc.date.issued1967-07-15en_US
dc.identifierRLE_QPR_086_IXen_US
dc.identifier.urihttp://hdl.handle.net/1721.1/55624
dc.descriptionContains reports on four research projects.en_US
dc.description.sponsorshipNational Aeronautics and Space Administration (Grant NGR-22-009-091)en_US
dc.description.sponsorshipM.I.T. Cabot Solar Energy Funden_US
dc.description.sponsorshipJoint Services Electronics Programs (U. S. Army, U. S. Navy, and U. S. Air Force) under Contract DA 28-043-AMC-02536(E)en_US
dc.language.isoenen_US
dc.publisherResearch Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)en_US
dc.relation.ispartofMassachusetts Institute of Technology, Research Laboratory of Electronics, Quarterly Progress Report, July 15, 1967en_US
dc.relation.ispartofGeneral Physicsen_US
dc.relation.ispartofPhysical Electronics and Surface Physicsen_US
dc.relation.ispartofseriesMassachusetts Institute of Technology. Research Laboratory of Electronics. Quarterly Progress Report, no. 86en_US
dc.rightsCopyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved.en_US
dc.subject.otherPhysical Electronicsen_US
dc.subject.otherSurface Physicsen_US
dc.subject.otherDesorption, Dissociation, and Recombination of Halogen Gases on Metal Surfacesen_US
dc.subject.otherScreening of a Point Impurity in the Surface Region of an Electron Gasen_US
dc.subject.otherContact-Potential Measurements of the Adsorption of Nitrogen on (110) Tantalumen_US
dc.subject.otherThermionic and Adsorption Properties of Polycrystalline Refractory Metals Exposed to Oxygenen_US
dc.titlePhysical Electronics and Surface Physicsen_US
dc.typeTechnical Reporten_US


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